000			03135cgm a2200433Ia 4500
001			31624
003			AE-DuAU
005			20241122121747.0
007			vd cvaizz
008			050222r20041999cau031 vleng d
050	1	4	_aTK7874 _b.S5526 2004
090			_aDVD TK 7874 .S5526 2004
245	0	0	_aSilicon run lithography _h[videorecording] / _c a film by Ruth A. Carranza [in collaboration with the Stanford Nanofabrication Facility] ; producer/director, Ruth A. Carranza ; writers, Ruth Carranza, John Shott.
246	3	0	_aLithography
246	3		_aSilicon run.
260			_aMountain View, CA : _b Ruth Carranza Productions : _b Silicon Run Productions, _c c2004, 1999.
300			_a1 videodisc (31 min.) : _bsd., col. ; _c4 3/4 in.
490	1		_aSilicon Run films series
538			_aDVD; NTSC.
508			_aProducer/director Ruth A. Carranza ; writers Ruth Carranza, John Shott ; cinematographer, Wah Ho Chan ; editor, Pam Walton ; narrator, Susan Jerome, music, Neil Panton.
500			_aA presentation of Intel Foundation, Nikon Precision, Shipley, Cymer, Applied Materials, Inc., Semiconductor Equipment and Materials International, Stanford Nanofabrication Facility.
520			_aFeatures an in-depth look at the photolithography process in IC manufacturing, includes wafer preparation, photoresist coating, exposure (using i-line steppers and DUV scanners), wafer developing and inspection.
505	0	0	_g1. _tIntroduction -- _g2. _tFabrication overview -- _tIC design -- _tMask design & manufacture -- _tFabrication processes -- _g3. _tPhotolithography station -- _tExposure systems -- _tTrack system -- _tPhotolithography chemicals -- _tPhotoresist manufacture -- _tResist viscosity & tolerances -- _tI-line exposure light source -- _g4. _tTrack system -- _tDehydration bake -- _tWafer prime -- _tResist spread -- _tEdge bead dissolve -- _tSoft bake -- _g5. _tI-line stepper -- _tMask -- _t5:1 image reduction -- _tWafer stage -- _tExposure light path -- _tStep and expose system -- _tWafer develop -- _tWafer rinse and dry -- _tHard bake -- _tWafer inspection -- _g6. _tDUV excimer scanner -- _tCritical dimensions -- _tExposure wave length -- _tStep and scan exposure system -- _tAnti-reflective coat deposition -- _tDUV resist -- _t4:1 image reduction -- _tDUV laser exposure -- _tHard bake -- _tWafer inspection -- _g7. _tEnding and credits.
511			_aNarrator, Susan Jerome.
650		0	_aPhotolithography. _9183391
650		0	_aIntegrated circuits _xDesign and construction. _9183392
700	1		_aCarranza, Ruth A., _d1949- _9169460
700	1		_aShott, John. _9183393
700	1		_aJerome, Susan. _9183394
710	2		_aStanford Nanofabrication Facility. _9183395
710	2		_aSilicon Run Productions. _9169467
710	2		_aRuth Carranza Productions. _9183396
710	2		_aStanford Nanofabrication Facility. _9183395
830		0	_aSilicon Run series _9183397
907			_a31624 _b02-28-11 _c02-28-11
942			_cDVD _02
998			_amedia _b02-28-11 _cm _dg _e- _feng _gcau _h0
945			_g0 _i5047745 _j0 _lmedia _o- _p493.15 _q- _r- _s- _t33 _u2 _v2 _w2 _x0 _yi12274355 _z02-28-11
999			_c31624 _d31624