000			02038ngm a2200385Ia 4500
001			31625
003			AE-DuAU
005			20241122121747.0
007			vd cvaiz-
008			050411r20041998cau031 vleng d
050	1	4	_aTK7874 _b.S525 2004
090			_aDVD TK 7874 .S525 2004
245	0	0	_aSilicon run deposition _h[videorecording] / _ca film by Ruth A. Carranza [in collaboration with Stanford Nanofabrication Facility] ; producer/director, Ruth A. Carranza ; writers, Ruth Carranza, John Shott.
246	3	0	_aDeposition.
246	3		_aSilicon run
260			_aMountain View, CA : _bRuth Carranza Productions : _bSilicon Run Productions, _cc2004, 1998.
300			_a1 videodisc (31 min.) : _bsd., col. ; _c4 3/4 in.
500			_aA presentation of the Intel Foundation, Applied Materials Inc, Air Products and Chemicals Inc., Nikon Inc., Semiconductor Equipment and Materials International, Stanford Nanofabrication Facility.
505	0		_aIntroduction -- Raw material elements -- Silicon dioxide film -- Silicon nitride film -- Field oxide -- Polysilicon gates -- Transistor insulation -- Circuit wiring -- Ending & credits.
511	0		_aNarrator, Susan Jerome.
520			_aAn expansion of the deposition process shown in the earlier Silicon run films. Follows the manufacturing process by which IC wafers are made into chips used in microcomputers and multichip units of high-end computers.
538			_aDVD; NTSC
650		0	_aThin films. _9161360
650		0	_aIntegrated circuits _xDesign and construction. _9183398
700	1		_aCarranza, Ruth A., _d1949- _9169460
700	1		_aShott, John. _9183399
700	1		_aJerome, Susan. _9183400
710	2		_aStanford Nanofabrication Facility. _9183401
710	2		_aRuth Carranza Productions. _9183402
710	2		_aSilicon Run Productions. _9169467
907			_a31625 _b02-28-11 _c02-28-11
942			_cDVD _02
998			_amedia _b02-28-11 _cm _dg _e- _feng _gcau _h0
945			_g0 _i5047718 _j0 _lmedia _o- _p493.15 _q- _r- _s- _t33 _u2 _v2 _w2 _x0 _yi12274367 _z02-28-11
999			_c31625 _d31625