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Silicon run lithography [videorecording] / a film by Ruth A. Carranza [in collaboration with the Stanford Nanofabrication Facility] ; producer/director, Ruth A. Carranza ; writers, Ruth Carranza, John Shott.
Series: Silicon Run seriesPublication details: Mountain View, CA : Ruth Carranza Productions : Silicon Run Productions, c2004, 1999.Description: 1 videodisc (31 min.) : sd., col. ; 4 3/4 inOther title:- Lithography
- Silicon run
- TK7874 .S5526 2004
Contents:
Production credits:
1. Introduction -- 2. Fabrication overview -- IC design -- Mask design & manufacture -- Fabrication processes -- 3. Photolithography station -- Exposure systems -- Track system -- Photolithography chemicals -- Photoresist manufacture -- Resist viscosity & tolerances -- I-line exposure light source -- 4. Track system -- Dehydration bake -- Wafer prime -- Resist spread -- Edge bead dissolve -- Soft bake -- 5. I-line stepper -- Mask -- 5:1 image reduction -- Wafer stage -- Exposure light path -- Step and expose system -- Wafer develop -- Wafer rinse and dry -- Hard bake -- Wafer inspection -- 6. DUV excimer scanner -- Critical dimensions -- Exposure wave length -- Step and scan exposure system -- Anti-reflective coat deposition -- DUV resist -- 4:1 image reduction -- DUV laser exposure -- Hard bake -- Wafer inspection -- 7. Ending and credits.
- Producer/director Ruth A. Carranza ; writers Ruth Carranza, John Shott ; cinematographer, Wah Ho Chan ; editor, Pam Walton ; narrator, Susan Jerome, music, Neil Panton.
| Item type | Current library | Home library | Shelving location | Call number | Status | Barcode | |
|---|---|---|---|---|---|---|---|
DVDs
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American University in Dubai | American University in Dubai | AUDIO & DVD Collection | DVD TK 7874 .S5526 2004 (Browse shelf(Opens below)) | Available | 5047745 |
DVD; NTSC.
Producer/director Ruth A. Carranza ; writers Ruth Carranza, John Shott ; cinematographer, Wah Ho Chan ; editor, Pam Walton ; narrator, Susan Jerome, music, Neil Panton.
A presentation of Intel Foundation, Nikon Precision, Shipley, Cymer, Applied Materials, Inc., Semiconductor Equipment and Materials International, Stanford Nanofabrication Facility.
Features an in-depth look at the photolithography process in IC manufacturing, includes wafer preparation, photoresist coating, exposure (using i-line steppers and DUV scanners), wafer developing and inspection.
1. Introduction -- 2. Fabrication overview -- IC design -- Mask design & manufacture -- Fabrication processes -- 3. Photolithography station -- Exposure systems -- Track system -- Photolithography chemicals -- Photoresist manufacture -- Resist viscosity & tolerances -- I-line exposure light source -- 4. Track system -- Dehydration bake -- Wafer prime -- Resist spread -- Edge bead dissolve -- Soft bake -- 5. I-line stepper -- Mask -- 5:1 image reduction -- Wafer stage -- Exposure light path -- Step and expose system -- Wafer develop -- Wafer rinse and dry -- Hard bake -- Wafer inspection -- 6. DUV excimer scanner -- Critical dimensions -- Exposure wave length -- Step and scan exposure system -- Anti-reflective coat deposition -- DUV resist -- 4:1 image reduction -- DUV laser exposure -- Hard bake -- Wafer inspection -- 7. Ending and credits.
Narrator, Susan Jerome.
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